Quantitative analysis of interfacial impurities using secondary‐ion mass spectrometry
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.91343
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1. Influence of atomic mixing and preferential sputtering on depth profiles and interfaces
2. Evaluation of a cesium primary ion source on an ion microprobe mass spectrometer
3. Sputtering of PtSi
4. Recoil mixing in solids by energetic ion beams
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