Suppressed grain-boundary scattering in atomic layer deposited Nb:TiO2 thin films-Reference-Cited by-同舟云学术

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Suppressed grain-boundary scattering in atomic layer deposited Nb:TiO2 thin films

Published:2015-11-09 Issue:19 Volume:107 Page:192102
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Niemelä Janne-Petteri¹,Hirose Yasushi²³⁴,Shigematsu Kei³⁴,Sano Masahito²,Hasegawa Tetsuya²³⁴,Karppinen Maarit¹

Affiliation:

1. Department of Chemistry, Aalto University, FI-00076 Aalto, Finland

2. Department of Chemistry, The University of Tokyo, Tokyo 113-0033, Japan

3. Kanagawa Academy of Science and Technology, Kawasaki 213-0012, Japan

4. CREST, Japan Science and Technology Agency, Tokyo 113-0033, Japan

Funder

European Research Council (ERC)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4935425

Reference23 articles.

1. A transparent metal: Nb-doped anatase TiO2

2. rf magnetron sputter deposition of transparent conducting Nb-doped TiO2 films on SrTiO3

3. Properties of TiO2-based transparent conducting oxides

4. Niobium doped TiO2: Intrinsic transparent metallic anatase versus highly resistive rutile phase

5. Review of the anatase to rutile phase transformation

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1. Enhanced optical and electrical properties of Nb-doped TiO2 thin films synthesized by atomic layer deposition using the supercycle strategy;Journal of Alloys and Compounds Communications;2024-09

2. Fabrication of conductive Nb-doped anatase TiO₂ thin films by mist chemical vapor deposition using aqueous solutions of water-soluble Ti and Nb compounds;Japanese Journal of Applied Physics;2024-04-01

3. Low Resistance TiO2/p-Si Heterojunction for Tandem Solar Cells;Materials;2020-06-25

4. Atomic layer deposition of Nb-doped TiO2: Dopant incorporation and effect of annealing;Journal of Vacuum Science & Technology A;2020-03

5. The relationship between carrier mobility and bicrystalline grains boundary of rutile TiO2 film;Modern Physics Letters B;2019-06-06

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