Relationship of background carrier concentration and defects in GaN grown by metalorganic vapor phase epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.120341
Reference10 articles.
1. Growth of epitaxial layers of gallium nitride on silicon carbide and corundum substrates
2. Growth of epitaxial layers of gallium nitride on silicon carbide and corundum substrates
3. Growth of high optical and electrical quality GaN layers using low‐pressure metalorganic chemical vapor deposition
4. Growth of high optical and electrical quality GaN layers using low‐pressure metalorganic chemical vapor deposition
5. A new technique for crystallographic characterization of heteroepitaxial crystal films
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