Erratum: “Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times” [Appl. Phys. Lett. <b>123</b>, 182902 (2023)]-Reference-Cited by-同舟云学术

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Erratum: “Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times” [Appl. Phys. Lett. 123, 182902 (2023)]

Published:2023-12-11 Issue:24 Volume:123 Page:
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:

Author:

van de Poll Mike L.¹^ORCID,Jain Hardik¹²^ORCID,Hilfiker James N.³^ORCID,Utriainen Mikko⁴^ORCID,Poodt Paul¹⁵^ORCID,Kessels Wilhelmus M. M.¹^ORCID,Macco Bart¹^ORCID

Affiliation:

1. Department of Applied Physics and Science Education, Eindhoven University of Technology 1 , 5600 MB Eindhoven, The Netherlands

2. TNO/Holst Centre, High Tech Campus 31 2 , 5656 AE Eindhoven, The Netherlands

3. J.A. Woollam Co., Inc 3 ., 311 South 7th Street, Lincoln, Nebraska 68508, USA

4. Chipmetrics Ltd. 4 , Yliopistokatu 7, 80130 Joensuu, Finland

5. SparkNano B.V. 5 , Esp 266, 5633 AC Eindhoven, The Netherlands

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

https://pubs.aip.org/aip/apl/article-pdf/doi/10.1063/5.0188189/18254140/249901_1_5.0188189.pdf

Reference2 articles.

1. Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times;Appl. Phys. Lett.,2023

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