Efficiency of oxygen plasma cleaning of reactive ion damaged silicon surfaces
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99269
Reference8 articles.
1. Silicon etching mechanisms in a CF4/H2glow discharge
2. A study of CClF3/H2reactive ion etching damage and contamination effects in silicon
3. Investigation of Reactive‐Ion‐Etching‐Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue Removal
4. Studies of atomic and molecular fluorine reactions on silicon surfaces
5. Properties of oxidized silicon as determined by angular-dependent X-ray photoelectron spectroscopy
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