Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.121601
Reference12 articles.
1. Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
2. Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
3. Fluorocarbon Films from Plasma Polymerization of Hexafluoropropylene and Hydrogen
4. Fluorocarbon Films from Plasma Polymerization of Hexafluoropropylene and Hydrogen
5. Fluorocarbon Films from Plasma Polymerization of Hexafluoropropylene and Hydrogen
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