Wafer-scale low-disorder 2DEG in 28Si/SiGe without an epitaxial Si cap

Abstract

We grow 28Si/SiGe heterostructures by reduced-pressure chemical vapor deposition and terminate the stack without an epitaxial Si cap but with an amorphous Si-rich layer obtained by exposing the SiGe barrier to dichlorosilane at 500 °C. As a result, 28Si/SiGe heterostructure field-effect transistors feature a sharp semiconductor/dielectric interface and support a two-dimensional electron gas with enhanced and more uniform transport properties across a 100 mm wafer. At T = 1.7 K, we measure a high mean mobility of (1.8±0.5)×105 cm2/V s and a low mean percolation density of (9±1)×1010 cm−2. From the analysis of Shubnikov–de Haas oscillations at T = 190 mK, we obtain a long mean single particle relaxation time of (8.1±0.5) ps, corresponding to a mean quantum mobility and quantum level broadening of (7.5±0.6)×104 cm2/V s and (40±3) μeV, respectively, and a small mean Dingle ratio of (2.3±0.2), indicating reduced scattering from long range impurities and a low-disorder environment for hosting high-performance spin-qubits.