Photodissociation of highly vibrationally excited NH3 in the 5νN–H region: Initial vibrational state dependence of N–H bond dissociation cross section
Author:
Affiliation:
1. Department of Materials Science, Japan Atomic Energy Research Institute, Tokai-mura, Naka-gun, Ibaraki 319-1195, Japan
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference82 articles.
1. F. F. Crim, Science SCIEAS249, 1387 (1990).SCIEAS0036-8075
2. F. F. Crim, Annu. Rev. Phys. Chem. ARPLAP44, 397 (1993).ARPLAP0066-426X
3. F. F. Crim, J. Phys. Chem. JPCHAX100, 12725 (1996).JPCHAX0022-3654
4. I. Bar and S. Rosenwaks, Int. Rev. Phys. Chem. IRPCDL20, 711 (2001).IRPCDL0144-235X
5. R. L. Vander Wal, J. L. Scott, and F. F. Crim, J. Chem. Phys. JCPSA692, 803 (1990).JCPSA60021-9606
Cited by 29 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Optical emission in the dissociation of ammonia by low energy He+ ions;The European Physical Journal D;2017-03
2. Luminescence in collision-induced dissociation of ND3 by H+, H2+, and H3+ beams at energies below 1000eV;Chemical Physics;2017-02
3. State to State Photodissociation Dynamics of Vibrationally Excited D2O in B Band;Chinese Journal of Chemical Physics;2015-08-27
4. Tunneling Dynamics of the NH3 (Ã) State Observed by Time-Resolved Photoelectron and H Atom Kinetic Energy Spectroscopies;The Journal of Physical Chemistry A;2014-09-25
5. Full-Dimensional Quantum Dynamics of Vibrationally Mediated Photodissociation of NH3 and ND3 on Coupled Ab Initio Potential Energy Surfaces: Absorption Spectra and NH2(Ã2A1)/NH2(X̃2B1) Branching Ratios;The Journal of Physical Chemistry A;2014-07-25
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3