Surface aligned photochemistry: Photodissociation of Cl2 and Cl2⋯Cl adsorbed on LiF(001)
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.481574
Reference59 articles.
1. Surface etching of InP(100) by chlorine
2. Gallium arsenide surface chemistry and surface damage in a chlorine high density plasma etch process
3. Prelude to etching: The surface interaction of chlorine on GaAs(110)
4. Projection-patterned etching of silicon in chlorine atmosphere with a KrF excimer laser
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1. Origin of Coverage Dependence in Photoreactivity of Carboxylate on TiO2(110): Hindering by Charged Coadsorbed Hydroxyls;ACS Catalysis;2015-10-03
2. Surface-Aligned Femtochemistry: Molecular Reaction Dynamics on Oxide Surfaces;Springer Series in Chemical Physics;2014
3. Photoinduced charge-transfer reaction at surfaces. II. HBr⋯Nan/LiF(001)+hv(610 nm)→Br−Nan+/LiF(001)+H(g);The Journal of Chemical Physics;2003-11-08
4. Transition state in metal atom reactions;International Reviews in Physical Chemistry;2003-04
5. Ultraviolet Photodissociation Dynamics of Cl2 and CFCl3 Adsorbed on Water Ice Surfaces;The Journal of Physical Chemistry A;2003-02-14
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