Amorphous lanthanide-doped TiOx dielectric films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.124058
Reference11 articles.
1. Plasma enhanced chemical vapor deposition of TiO2 in microwave‐radio frequency hybrid plasma reactor
2. Structural and electrical characterization of TiO2 grown from titanium tetrakis-isopropoxide (TTIP) and TTIP/H2O ambients
3. Effects of Electrode Materials and Annealing Ambients on the Electrical Properties ofTiO2Thin Films by Metalorganic Chemical Vapor Deposition
4. Minimization of fatigue in ferroelectric films
5. Sol gel preparation of mixed cerium—titanium oxide thin films
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