Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from a Ta(OC2H5)5 precursor
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.367277
Reference29 articles.
1. Process and device technologies for 1 Gbit dynamic random-access memory cells
2. Thermally robust Ta/sub 2/O/sub 5/ capacitor for the 256-Mbit DRAM
3. Fabrication of n-metal–oxide semiconductor field effect transistor with Ta2O5 gate oxide prepared by plasma enhanced metalorganic chemical vapor deposition
4. Use of carbon-free Ta2O5 thin-films as a gate insulator
5. Fabrication and characterization of Si-MOSFET's with PECVD amorphous Ta2O5 gate insulator
Cited by 120 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Crystal growth in amorphous films of tantalum pentoxide;Molecular Crystals and Liquid Crystals;2023-05-23
2. Digital Performance Analysis of Double Gate MOSFET by Incorporating Core Insulator Architecture;Silicon;2022-03-30
3. Layer, interjacent and island polymorphous crystallization of amorphous Ta<sub>2</sub>O<sub>5</sub>films;Functional Materials;2022-03-30
4. Optical properties and current conduction in annealed (Ta2O5)0.94 – (TiO2)0.06 thin films;Superlattices and Microstructures;2021-10
5. Which phase of Ta 2 O 5 being of the largest dielectric constant;Journal of the American Ceramic Society;2021-08-02
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3