Using a neural network to proximity correct patterns written with a Cambridge electron beam microfabricator 10.5 lithography system
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103456
Reference10 articles.
1. Monte Carlo Calculations on Electron Scattering in a Solid Target
2. Energy dissipation in a thin polymer film by electron beam scattering
3. A Monte Carlo simulation of electron beam lithography used to create 0.5-μm structures on GaAs
4. A Monte Carlo simulation of damage to the gate oxide of metal‐oxide‐silicon field‐effect transistors from electron beam lithography
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