Compositional effects on plasma‐enhanced metalorganic chemical vapor deposition of YBa2Cu3O7−xthin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104752
Reference9 articles.
1. High critical-current density of Y-Ba-Cu-O superconducting films prepared by CVD
2. Y-Ba-Cu-O Superconducting Films with HighJcValues by MOCVD using Ba-Addition Products
3. High critical current densities in YBa2Cu3O7−xthin films formed by metalorganic chemical vapor deposition at 730 °C
4. Low‐temperatureinsituformation of Y‐Ba‐Cu‐O highTcsuperconducting thin films by plasma‐enhanced metalorganic chemical vapor deposition
5. Insitugrowth of YBa2Cu3O7−xhighTcsuperconducting thin films directly on sapphire by plasma‐enhanced metalorganic chemical vapor deposition
Cited by 43 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Plasma interactions with the N2O background gas: Enhancing the oxidization of alkaline-earth species for pulsed laser deposition;Journal of Applied Physics;2018-08-28
2. Composition Effects on the Critical Current of MOCVD-Processed Zr:GdYBCO Coated Conductors in an Applied Magnetic Field;IEEE Transactions on Applied Superconductivity;2011-06
3. Chemical Vapor Deposition of Metal-Containing Thin-Film Materials from Organometallic Compounds;Progress in Inorganic Chemistry;2007-03-09
4. Single liquid precursor delivery photo-assisted metalorganic chemical vapor deposition of high quality YBa2Cu3O7−x thin/thick films;Physica C: Superconductivity;2002-09
5. YBCO films with induced composition gradient: an accurate exploration of the film growth characteristics;Physica C: Superconductivity;2001-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3