Role of carrier diffusion in lattice heating during pulsed laser annealing
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.91306
Reference10 articles.
1. Laser annealing shows promise for making p‐n junctions
2. Some features of laser annealing of implanted silicon layers
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4. Theoretical analysis of thermal and mass transport in ion‐implanted laser‐annealed silicon
5. Temperature rise induced by a laser beam II. The nonlinear case
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