Fundamental understanding of chemical processes in extreme ultraviolet resist materials-Reference-Cited by-同舟云学术

Fundamental understanding of chemical processes in extreme ultraviolet resist materials

Published:2018-10-21 Issue:15 Volume:149 Page:154305
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:The Journal of Chemical Physics

Author:

Kostko Oleg¹^ORCID,Xu Bo¹,Ahmed Musahid¹^ORCID,Slaughter Daniel S.¹^ORCID,Ogletree D. Frank²^ORCID,Closser Kristina D.²,Prendergast David G.²,Naulleau Patrick³,Olynick Deirdre L.²,Ashby Paul D.²^ORCID,Liu Yi²,Hinsberg William D.⁴,Wallraff Gregory M.⁵

Affiliation:

1. Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA

2. Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA

3. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA

4. Columbia Hill Technical Consulting, Fremont, California 94539, USA

5. IBM Almaden, San Jose, California 95120, USA

Funder

U.S. Department of Energy

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://aip.scitation.org/doi/am-pdf/10.1063/1.5046521

Reference43 articles.

1. Optical lithography: Introduction

2. The Paths To Subhalf-Micrometer Optical Lithography

3. Nanolithography in microelectronics: A review

4. Review on Micro- and Nanolithography Techniques and their Applications

5. Soft x-ray projection lithography using an x-ray reduction camera

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Additive-Assisted Forming High-Quality Thin Films of Sn–Oxo Cluster for Nanopatterning;ACS Applied Materials & Interfaces;2024-07-24

2. Evaluation of Electron Blur for Different Electron Energies;Journal of Photopolymer Science and Technology;2024-06-25

3. Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum;Journal of Photopolymer Science and Technology;2024-06-25

4. Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light;Nanomaterials;2024-06-05

5. Dissociative photoionization of phenyl triflate, a photoacid generator for photolithography, at 92 eV;The Journal of Chemical Physics;2024-04-01