In situcorrelation between the optical and electrical properties of thin intrinsic and n-type microcrystalline silicon films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.365325
Reference18 articles.
1. Kinetic study of the heterogeneous Si/H system under low-pressure plasma conditions by means of mass spectrometry
2. Control of silicon network structure in plasma deposition
3. Plasma deposition of microcrystalline silicon: the selective etching model
4. Role of Hydrogen Atoms in the Formation Process of Hydrogenated Microcrystalline Silicon
5. Growth of Amorphous and Crystalline Silicon by HR-CVD (Hydrogen Radical Enhanced CVD)
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