Detection of latent scratches and swirl on silicon wafers by scanned surface photoresponse
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.328229
Reference3 articles.
1. Semiconductor profiling using an optical probe
2. Correlation of electrolytic‐etch and surface‐photovoltage techniques for the detection of electrically active defects in silicon
3. Dislocation Etch for (100) Planes in Silicon
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. AC Photovoltaic Detection of Buried Structures of Semiconductor Wafers;Review of Progress in Quantitative Nondestructive Evaluation;1995
2. Modeling of luminescence phase delay for nondestructive characterization of Si wafers;Journal of Applied Physics;1989-09-15
3. Mapping the quality of semiconductor wafers;Review of Scientific Instruments;1986-04
4. Exploratory study of the polycrystalline n-silicon photoelectrode by the scanning laser spot technique;Solar Energy Materials;1985-05
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