Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2072147
Reference20 articles.
1. Extreme ultraviolet light sources for use in semiconductor lithography—state of the art and future development
2. Plasma sources for EUV lithography exposure tools
3. Point Defects in Lithium Fluoride by EUV and Soft X-Rays Exposure for X-Ray Microscopy and Optical Applications
4. Luminescent patterns based on color centers generated in lithium fluoride by extreme ultraviolet radiation and soft X-rays
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