Electron attachment to hexafluoropropylene oxide (HFPO)-Reference-Cited by-同舟云学术

Electron attachment to hexafluoropropylene oxide (HFPO)

Published:2018-11-28 Issue:20 Volume:149 Page:204305
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:J. Chem. Phys.

Author:

Zawadzki M.¹²,Chachereau A.³^ORCID,Kočišek J.¹,Franck C. M.³^ORCID,Fedor J.¹

Affiliation:

1. J. Heyrovský Institute of Physical Chemistry, Czech Academy of Sciences, Dolejškova 3, 18223 Prague, Czech Republic

2. Department of Atomic, Molecular and Optical Physics, Faculty of Applied Physics and Mathematics, Gdańsk University of Technology, ul. G. Narutowicza 11/12, 80-233 Gdańsk, Poland

3. Power Systems and High Voltage Laboratories, ETH Zurich, Physikstr. 3, 8092 Zurich, Switzerland

Funder

ABB Switzerland Ltd

GE Grid

Pfiffner Technologie AG

Siemens AG

Grantová Agentura České Republiky

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5051724

Reference31 articles.

1. Decomposition reactions of hexafluoropropylene oxide (HFPO): Rate coefficients calculated at different temperatures using ab initio and DFT reaction paths

2. Time resolved ultraviolet absorption spectroscopy of pulsed fluorocarbon plasmas

3. Mechanistic reaction pathway for hexafluoropropylene oxide pulsed plasma deposition of PTFE-like films

4. A. Milella, F. Palumbo, and R. d’Agostino, in Advanced Plasma Technology, edited by R. d’Agostino, P. Favia, Y. Kawai, H. Ikegami, N. Sato, and F. Arefi-Khonsari (WILEY-VCH Verlag GmbH, Weinheim, 2008), pp. 175–195.

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