Measurement of Film Thickness Using Infrared Interference-Reference-Cited by-同舟云学术

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Measurement of Film Thickness Using Infrared Interference

Published:1967-08 Issue:8 Volume:38 Page:1107-1109
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Dumin D. J.

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1720978

Reference8 articles.

1. Interference Method for Measuring the Thickness of Epitaxially Grown Films

2. Thickness measurement of silicon dioxide layers by ultraviolet-visible interference method

3. A Method for Measuring the Thickness of Epitaxial Silicon Films

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