Solid‐phase regrowth of amorphous GaAs grown by low‐temperature molecular‐beam epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.110057
Reference9 articles.
1. Formation of arsenic precipitates in GaAs buffer layers grown by molecular beam epitaxy at low substrate temperatures
2. The role of As in molecular-beam epitaxy GaAs layers grown at low temperature
3. Substrate temperature dependence of arsenic precipitate formation in AlGaAs and GaAs
4. Formation of As precipitates in GaAs by ion implantation and thermal annealing
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1. Crystallization of amorphous complex oxides: New geometries and new compositions via solid phase epitaxy;Current Opinion in Solid State and Materials Science;2018-12
2. Crystallization of amorphous InAs/GaAs films on GaAs;Journal of Crystal Growth;2011-05
3. Formation of highly conductive polycrystalline GaAs from annealed amorphous (Ga,As);Journal of Applied Physics;2003-05
4. Physical properties of amorphous gallium arsenide;Handbook of Thin Films;2002
5. Characterization of low range GaAs;Journal of Electronic Materials;1995-11
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