Ablation and blow‐off characteristics at 248 nm of Al, Sn and Ti targets used for thin film pulsed laser deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.362990
Reference30 articles.
1. Thin and ultra-thin epitaxial films of YBa2Cu3O7−δ deposited on LiNbO3 substrates by pulsed excimer laser ablation
2. Dual‐laser ablation for particulate‐free film growth
3. Effect of different oxidizing gases on the in-situ growth of YBa2Cu3O7−δ films by pulsed laser deposition
4. Growth of CuO films by pulsed laser deposition in conjunction with a pulsed oxidation source
5. Role of ions in ion-based film formation
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