A new technique for time‐resolved x‐ray diffraction measurements in the single‐bunch operation applied to laser annealing
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1145927
Reference5 articles.
1. Synchrotron X-Ray Diffraction Study of Silicon during Pulsed-Laser Annealing
2. Nanosecond resolution time-resolved x-ray study of silicon during pulsed-laser irradiation
3. Time-Resolved X-Ray Diffraction from a Silicon Crystal Irradiated by a Q-Switched Nd:YAG Laser
4. Time‐resolved x‐ray measurement system for studying the lattice deformation of semiconductor crystals under laser irradiation
5. Refinement of time‐resolved x‐ray measurement system for studying the lattice deformation of silicon under pulsed Nd:YAG laser irradiation
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Time-resolved X-ray diffraction at NERL;Laser and Particle Beams;2001-01
2. Ultrashort X-ray pulse generation using subpicosecond electron linac;Journal of Nuclear Materials;2000-08
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