Pressure-induced evolution of structure and electronic property of GeP

Author:

Tao Yajun1ORCID,Xie Shiyu1,Lu Tenglong2,Hu Chuansheng1,Liu Hengjie1,Zhang Huanjun34,Cheng Xuerui34,Liu Miao25ORCID,Qi Zeming1ORCID

Affiliation:

1. National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, Anhui 230029, People's Republic of China

2. Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China

3. School of Physics and Electronic Engineering, Zhengzhou University of Light Industry, Zhengzhou, Henan 450002, China

4. Henan Key Laboratory of Magnetoelectric Information Functional Materials, Zhengzhou, Henan 450002, China

5. Songshan Lake Materials Laboratory, Dongguan, Guangdong 523808, China

Abstract

The monoclinic semiconductor GeP is a new class of Group IV–V layered material, and it shows attractive anisotropic optical and electronic properties. In this paper, we investigate the structural and electronic evolution of layered GeP under pressure, using in situ x-ray diffraction, Raman and infrared spectra, and the density functional theory. All characterization methods reveal that the pressure causes two obvious phase changes. One isostructural transition is observed around 6 GPa. Above 21 GPa, another crystalline-to-amorphous transformation is obtained. It is worth noting that the high-pressure amorphous state can be retained at ambient conditions after the pressure is released. In addition, the pressure-induced red-shift of absorbance edge suggests its bandgap decreases with pressure. This result indicates that pressure has a significant effect on GeP. Meanwhile, it also provides a method for obtaining amorphous GeP, which is of interest to the energy storage community as it is a potential anode material for lithium-ion batteries.

Funder

National Natural Science Foundation of China

National Key R&D Program of China

Key Research Project of Higher Education of Henan Province

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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