Combined dry plasma etching and online metrology for manufacturing highly focusing x-ray mirrors-Reference-Cited by-同舟云学术

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Combined dry plasma etching and online metrology for manufacturing highly focusing x-ray mirrors

Published:2016 Issue: Volume: Page:
ISSN:0094-243X
Container-title:AIP Conference Proceedings
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Berujon S.,Ziegler E.,da Cunha S.,Bonneau F.,Baker R.,Clement J.-M.,Perez M.,Thuaudet S.,Malandrino G.,Vivo A.,Lantelme B.,Barrett R.,Susini J.

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Reference8 articles.

1. Design parameters for hard x-ray mirrors: the European Synchroton Radiation Facility case

2. Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining

3. The ESRF BM05 Metrology Beamline: Instrumentation And Performance Upgrade

4. Ion beam profiling of aspherical X-ray mirrors

5. On-Line Mirror Surfacing Monitored by X-ray Shearing Interferometry and X-ray Scattering

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