Tunnel junction-enabled monolithically integrated GaN micro-light emitting transistor

Author:

Rahman Sheikh Ifatur1ORCID,Awwad Mohammad1ORCID,Joishi Chandan1ORCID,Jamal-Eddine Zane1ORCID,Gunning Brendan2ORCID,Armstrong Andrew2ORCID,Rajan Siddharth13ORCID

Affiliation:

1. Department of Electrical and Computer Engineering, The Ohio State University 1 , Columbus, Ohio 43210, USA

2. Sandia National Laboratory 2 , Albuquerque, New Mexico 87185-1085, USA

3. Department of Material Science and Engineering, The Ohio State University 3 , Columbus, Ohio 43210, USA

Abstract

GaN/InGaN microLEDs are a very promising technology for next-generation displays. Switching control transistors and their integration are key components in achieving high-performance, efficient displays. Monolithic integration of microLEDs with GaN switching devices provides an opportunity to control microLED output power with capacitive (voltage)-controlled rather than current-controlled schemes. This approach can greatly reduce system complexity for the driver circuit arrays while maintaining device opto-electronic performance. In this work, we demonstrate a 3-terminal GaN micro-light emitting transistor that combines a GaN/InGaN blue tunneling-based microLED with a GaN n-channel FET. The integrated device exhibits excellent gate control, drain current control, and optical emission control. This work provides a promising pathway for future monolithic integration of GaN FETs with microLED to enable fast switching, high-efficiency microLED display and communication systems.

Funder

Building Technologies Office

Office of Naval Research

Intel Corporation

Publisher

AIP Publishing

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