Stress relaxation of passivated aluminum line metallizations on silicon substrates
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347222
Reference18 articles.
1. Measurement and Interpretation of stress in aluminum-based metallization as a function of thermal history
2. Plastic properties of thin films on substrates as measured by submicron indentation hardness and substrate curvature techniques
3. X-ray determination of the residual stresses in thin aluminum films deposited on silicon substrates
4. Stress relaxation of continuous film and narrow line metallizations of aluminum on silicon substrates
Cited by 85 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Characterization of electromigration-induced short-range stress development in Al(0.25 at. % Cu) conductor line;Journal of Applied Physics;2024-01-12
2. Strategy against electromigration-induced stress by passivation thickness design;Thin Solid Films;2023-11
3. Thermal Stress Characteristics and Stress-Induced Void Formation in Aluminum and Copper Interconnects;Electromigration in Metals;2022-04-30
4. Introduction to Electromigration;Electromigration in Metals;2022-04-30
5. Stress Migration Modeling Using Probabilistic Physics of Failure;IEEE Transactions on Device and Materials Reliability;2018-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3