Growth of clean amorphous silicon–carbon alloy films by hot‐filament assisted chemical vapor deposition technique
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.113352
Reference18 articles.
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Silicon Oxycarbide Thin films and Nanostructures: Synthesis, Properties and Applications;Modern Technologies for Creating the Thin-film Systems and Coatings;2017-03-08
2. Influence of filament-to-substrate distance on the spectroscopic, structural and optical properties of silicon carbide thin films deposited by HWCVD technique;Journal of Materials Science: Materials in Electronics;2014-03-27
3. Pressure dependent structural and optical properties of silicon carbide thin films deposited by hot wire chemical vapor deposition from pure silane and methane gases;Journal of Materials Science: Materials in Electronics;2012-10-18
4. Hot wire chemical vapour deposition (HWCVD) of boron carbide thin films from ortho-carborane for neutron detection application;Thin Solid Films;2011-05
5. High-rate, low-temperature synthesis of composition controlled hydrogenated amorphous silicon carbide films in low-frequency inductively coupled plasmas;Journal of Physics D: Applied Physics;2008-02-12
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