Enhanced permeability dielectric FeCo/Al2O3multilayer thin films with tailored properties deposited by magnetron sputtering on silicon-Reference-Cited by-同舟云学术

Enhanced permeability dielectric FeCo/Al2O3multilayer thin films with tailored properties deposited by magnetron sputtering on silicon

Published:2019-03 Issue:3 Volume:9 Page:035243
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Falub Claudiu V.¹^ORCID,Pietambaram Srinivas V.²,Yildirim Oguz³,Meduňa Mojmír⁴⁵,Caha Ondrej⁴⁵,Hida Rachid⁶,Zhao Xue¹³,Ambrosini Jan¹,Rohrmann Hartmut¹,Hug Hans J.³

Affiliation:

1. Evatec AG, Hauptstrasse 1a, CH-9477 Trübbach, Switzerland

2. Intel Corporation, W. Chandler Blvd. 5000, Chandler, AZ 85226, United States

3. Nanoscale Materials Science, Empa, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland

4. Department of Condensed Matter Physics, Masaryk University, Kotlářska 2, CZ-61137 Brno, Czech Republic

5. CEITEC, Masaryk University, Kamenice 5, CZ-60177 Brno, Czech Republic

6. Univ. Grenoble Alpes, CEA-LETI, Rue des Martyrs 17, FR-38054 Grenoble, France

Funder

Central European Institute of Technology

Kommission für Technologie und Innovation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5079477

Reference28 articles.

1. Magnetoelectronics

2. Spintronics: A Spin-Based Electronics Vision for the Future

3. Programmable computing with a single magnetoresistive element

4. Spin-dependent tunneling in discontinuous metal/insulator multilayers

5. Transport properties of discontinuous Co/sub 80/Fe/sub 20//Al/sub 2/O/sub 3/ multilayers, prepared by ion beam sputtering

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