Author:
Żuk J.,Krzyżanowska H.,Clouter M. J.,Bromberek M.,Bubert H.,Rebohle L.,Skorupa W.
Subject
General Physics and Astronomy
Cited by
2 articles.
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1. Amorphous Ge quantum dots embedded in SiO2 formed by low energy ion implantation;Journal of Applied Physics;2008-06-15
2. Ge nano-layer fabricated by high-fluence low-energy ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-09