1. Enhanced Deposition in Electron Beam Targets Due to Beam Stagnation
2. also, E. J. T. Burns (private communication) and L. P. Mix (private communication).
3. J. Chang, M. M. Widner, A. V. Farnsworth, Jr., R. J. Leeper, T. S. Prevender, L. Baker, and J. N. Olson, inProceedings of the 2nd International Topical Conference on High Power Electron and Ion Beam Research and Technology(Laboratory of Plasma Studies, Cornell University, Ithaca, New York, 1977), Vol. I, p. 195.
4. D. Mosher, G. Cooperstein, S. J. Stephanakis, S. A. Goldstein, D. G. Colombant, and R. Lee, inProceedings of the 2nd International Topical Conference on High Power Electron and Ion Beam Research and Technology(Laboratory of Plasma Studies, Cornell University, Ithaca, New York, 1977), Vol. I, p. 257.
5. Production of 0.5-TW Proton Pulses with a Spherical Focusing, Magnetically Insulated Diode