Development of 40MHz inductively coupled plasma source and frequency effects on plasma parameters
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2838306
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1. Plasma generation and plasma sources
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5. The influence of antenna configuration and standing wave effects on density profile in a large-area inductive plasma source
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1. Experimental investigation of plasma parameters in 13.56 MHz/2 MHz cylindrical inductively coupled plasma;Acta Physica Sinica;2019
2. RF bias to suppress post-oxidation of μc-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna;Vacuum;2018-01
3. Electromagnetic, complex image model of a large area RF resonant antenna as inductive plasma source;Plasma Sources Science and Technology;2017-02-23
4. Study of the Characteristics of DC and ICP Hybrid Discharge Plasmas;Plasma Science and Technology;2015-03
5. Electron energy distributions in a magnetized inductively coupled plasma;Physics of Plasmas;2014-09
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