Electron cyclotron resonance plasma source for ion assisted deposition of thin films
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1150225
Reference20 articles.
1. Control of microstructure and properties of copper films using ion‐assisted deposition
2. Reactive Ion Etching Mechanism of Copper Film in Chlorine-based Electron Cyclotron Resonance Plasma
3. Temperature dependent electron cyclotron resonance etching of InP, GaP, and GaAs
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