An R-matrix study of electron induced processes in BF3 plasma
Author:
Affiliation:
1. Plasma Technology Research Center, National Fusion Research Institute, 37 Dongjangsan-ro, Gunsan, Jeollabuk-do 54004, South Korea
2. Department of Mathematics, Scottish Church College, 1 & 3 Urquhart Sq, Kolkata 700 006, India
Funder
National Fusion Research Institute
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5016218
Reference41 articles.
1. Surface chemical structure and doping characteristics of boron-doped Si nanowires fabricated by plasma doping
2. Energy distribution and depth profile in BF3 plasma doping
3. Cross sections and transport properties of positive ions in BF3 plasmas
4. Synthesis of c-BN films by using a low-pressure inductively coupled BF3–He–N2–H2 plasma
5. The effect of topographical local charging on the etching of deep-submicron structures in SiO2 as a function of aspect ratio
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1. Brief Review of Electron Collision Studies of Molecules Relevant to Plasma;Applied Science and Convergence Technology;2020-11-30
2. Electron scattering studies of BF and BF2;Journal of Physics B: Atomic, Molecular and Optical Physics;2020-10-22
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