Mechanism and kinetics of tetrachlorosilane reactions in an argon‐hydrogen microwave plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.333011
Reference32 articles.
1. Principles of photoelectrochemical, solar energy conversion
2. Chemical Processes in Vapor Deposition of Silicon: I . Deposition from and Etching by
3. Mechanisms of chemical vapor deposition of silicon
4. Effects of inert gas dilution of silane on plasma‐deposited a‐Si:H films
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