Fluorocarbon plasma etching and profile evolution of porous low-dielectric-constant silica
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1562333
Reference15 articles.
1. Effects of H2Addition in Magnetized Inductively Coupled C2F6Plasma Etching of Silica Aerogel Film
2. High-density plasma patterning of low dielectric constant polymers: A comparison between polytetrafluoroethylene, parylene-N, and poly(arylene ether)
3. High density plasma etching of low k dielectric polymers in oxygen-based chemistries
4. Etching of xerogel in high-density fluorocarbon plasmas
5. Surface modified spin-on xerogel films as interlayer dielectrics
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