Effect of the gas mixing technique on the plasma potential and emittance of the JYFL 14 GHz electron cyclotron resonance ion source
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2038647
Reference23 articles.
1. Role of low charge state ions in electron cyclotron resonance ion source plasmas
2. Influence of the biased electrode on the plasma potential in ECRIS
3. Plasma potentials and performance of the advanced electron cyclotron resonance ion source
4. A new plasma potential measurement instrument for plasma ion sources
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1. Enhanced Production of Multicharged Ions by Mixing Low Z Gas and Emittance Measurement on Electron Cyclotron Resonance Ion Source;Journal of Physics: Conference Series;2024-05-01
2. An extraction system design with a strongly inhomogeneous electric field for a JYFL electron cyclotron resonance ion source;Physics of Plasmas;2022-12
3. Experimental and numerical investigation of magneto-plasma optical properties toward measurements of opacity relevant for compact binary objects;Frontiers in Astronomy and Space Sciences;2022-10-04
4. Some aspects of the plasma potential in 3D simulation of ECRIS operation;Physics of Plasmas;2022-07
5. Development and validation of the numerical model of Electron Cyclotron Resonance Ion Sources;Journal of Instrumentation;2022-06-01
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