Co–Cr films prepared by sputtering using electron cyclotron resonance microwave plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Reference12 articles.
1. An analysis for the magnetization mode for high density magnetic recording
2. Extremely high bit density recording with single-pole perpendicular head
3. TEM Observation of Microstructure in Sputtered Co-Cr Film
4. Segregated microstructure in sputtered Co‐Cr film revealed by selective wet etching
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1. Note: Easy-to-maintain electron cyclotron resonance (ECR) plasma sputtering apparatus featuring hybrid waveguide and coaxial cables for microwave delivery;Review of Scientific Instruments;2016-06
2. Nonmagnetic thin layers of Ni3N;Journal of Applied Physics;2009-10
3. Low Temperature and High Rate Deposition of Ferrite Thin Films by Reactive Sputtering Method Using Electron Cyclotron Eesonance;Shinku;2006
4. Development of Low-Temperature and High-Rate-Deposition Technology for Ferrite Thin-Films using ECR Sputtering Apparatus designed for Mass Production;Journal of the Japan Society of Powder and Powder Metallurgy;2006
5. Fabrication of Ni-Zn Ferrite Thin Film Using the Low-Target-Voltage Reactive ECR Sputtering Method;Journal of the Magnetics Society of Japan;2005
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