On the feasibility of silicene encapsulation by AlN deposited using an atomic layer deposition process
Author:
Affiliation:
1. MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands
2. School of Materials Science, Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan
Funder
Funding Program for Next Generation World-Leading Researchers
Stichting voor Fundamenteel Onderzoek der Materie (Foundation for Fundamental Research on Matter)
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4907375
Reference29 articles.
1. Two- and One-Dimensional Honeycomb Structures of Silicon and Germanium
2. Quantum Spin Hall Effect in Silicene and Two-Dimensional Germanium
3. Valley-Polarized Metals and Quantum Anomalous Hall Effect in Silicene
4. Silicene: Compelling Experimental Evidence for Graphenelike Two-Dimensional Silicon
5. Experimental Evidence for Epitaxial Silicene on Diboride Thin Films
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