Oxygen vacancies stabilized 180° charged domain walls in ferroelectric hafnium oxide

Author:

Xu Zhongshan1ORCID,Zhu Xiaona12,Zhao Guo-Dong1ORCID,Zhang David Wei123,Yu Shaofeng13

Affiliation:

1. School of Microelectronics, Fudan University 1 , Shanghai 200433, China

2. Jiashan Fudan Institute 2 , Zhejiang 314109, China

3. National Integrated Circuit Innovation Center 3 , Shanghai 201203, China

Abstract

Ferroelectric domain walls (DWs) are spatial interfaces separating domains with distinct polarization orientations. Among these DWs, some can carry bound charges and display metallic-like conductivity. The feature is highly of interest for future nanoelectronics. However, the inherent instability of charged domain walls (CDWs) has posed a critical challenge for their experimental exploration. This Letter reports the head-to-head (HH) and tail-to-tail (TT) 180° CDWs within the context of ferroelectric hafnium oxide. We proposed that oxygen vacancy is a crucial factor stabilizing the periodic CDWs. Through meticulous first-principles calculations, we elaborated on the intricate properties of these CDWs, including their polarization profiles, and potential and charge distributions. Furthermore, we calculated the energy barrier for layer-by-layer propagation of a HH wall and carefully discussed the migration of a TT wall with oxygen vacancy. Our study can shed more light onto the characteristics of CDWs and their implications to hafnia-based ferroelectric devices.

Funder

Shanghai Sailing Program

Publisher

AIP Publishing

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