Oxygen vacancies stabilized 180° charged domain walls in ferroelectric hafnium oxide
Author:
Affiliation:
1. School of Microelectronics, Fudan University 1 , Shanghai 200433, China
2. Jiashan Fudan Institute 2 , Zhejiang 314109, China
3. National Integrated Circuit Innovation Center 3 , Shanghai 201203, China
Abstract
Funder
Shanghai Sailing Program
Publisher
AIP Publishing
Link
https://pubs.aip.org/aip/apl/article-pdf/doi/10.1063/5.0179879/18291211/012902_1_5.0179879.pdf
Reference44 articles.
1. Ferroelectric domain walls for nanotechnology;Nat. Rev. Mater.,2021
2. Ferroelectric domain-wall logic units;Nat. Commun.,2022
3. Roadmap for ferroelectric domain wall nanoelectronics;Adv. Funct. Mater.,2022
4. Theory of hypothetical ferroelectric superlattices incorporating head-to-head and tail-to-tail 180 domain walls;Phys. Rev. B,2006
5. Charge compensation of head-to-head and tail-to-tail domain walls in barium titanate and its influence on conductivity;J. Appl. Phys.,2014
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Progress in computational understanding of ferroelectric mechanisms in HfO2;npj Computational Materials;2024-08-23
2. Formation and energetics of head-to-head and tail-to-tail domain walls in hafnium zirconium oxide;Scientific Reports;2024-04-29
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