Comment on “(Ta1−xNbx)2O5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I–V characteristics” [J. Appl. Phys.90, 4532 (2001)]
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1571961
Reference16 articles.
1. (Ta1−xNbx)2O5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I–V characteristics
2. Steady and transient conduction processes in anodic tantalum oxide
3. Electrical conduction in reactively sputtered tantalum oxide thin films
4. dc electrical conduction in thin Ta2O5films. I. Bulk‐limited conduction
5. DC Electroluminescence on M-I-S Structures in Thin Films
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3. Optical and Dielectric Characterization of Atomic Layer Deposited Nb2O5 Thin Films;ECS Solid State Letters;2012-01-01
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