Suppression of surface roughening kinetics of homogenously multilayered W films-Reference-Cited by-同舟云学术

Suppression of surface roughening kinetics of homogenously multilayered W films

Published:2015-11-07 Issue:17 Volume:118 Page:175301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Yang J. J.¹,Zhu H. L.¹,Wan Q.²,Yang Y. Y.¹,Liao J. L.¹^ORCID,Liu N.¹,Wang L. M.³

Affiliation:

1. Key Laboratory of Radiation Physics and Technology of Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, China

2. Institute of Systems Engineering, China Academy of Engineering Physics, Mianyang, Sichuan 621900, China

3. Department of Nuclear Engineering and Radiological Science, University of Michigan, Ann Arbor, Michigan 41089, USA

Funder

Focused Technology Development Fund of China Academy of Engineering Physics Science

National Fund of China for Fostering Talents in Basic Science

National Natural Science Foundation of China (NSFC)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4935136

Reference32 articles.

1. Resistivity of thin Cu films coated with Ta, Ti, Ru, Al, and Pd barrier layers from first principles

2. Quantum dot self-assembly in growth of strained-layer thin films: A kinetic Monte Carlo study

3. Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon

4. Surface morphology, corrosion resistance and in vitro bioactivity of P containing ZrO2 films formed on Zr by plasma electrolytic oxidation

5. Fractal Concepts in Surface Growth

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