On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge-Reference-Cited by-同舟云学术

On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge

Author:

Rudolph M.¹^ORCID,Revel A.²^ORCID,Lundin D.²³^ORCID,Brenning N.³⁴^ORCID,Raadu M. A.⁴,Anders A.¹⁵^ORCID,Minea T. M.²^ORCID,Gudmundsson J. T.⁴⁶^ORCID

Affiliation:

1. Leibniz Institute of Surface Engineering (IOM), Permoserstraße 15, 04318 Leipzig, Germany

2. Laboratoire de Physique des Gaz et Plasmas—LPGP, UMR 8578 CNRS, Université Paris-Saclay, 91405 Orsay Cedex, France

3. Plasma and Coatings Physics Division, IFM-Materials Physics, Linköping University, SE-581 83 Linköping, Sweden

4. Space and Plasma Physics, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-100 44 Stockholm, Sweden

5. Felix Bloch Institute of Solid State Physics, Leipzig University, Linnéstraße 5, 04103 Leipzig, Germany

6. Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Iceland

Funder

Icelandic Research Fund

Free State of Saxony and the European Development Fund

Swedish Research Council

Swedish Government Strategic Research Area in Materials Science and Functional Materials at Linkoping University

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

Reference64 articles.

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