Vapor etching of ion tracks in fused silica
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1467402
Reference11 articles.
1. HF vapor phase etching (HF/VPE): Production viability for semiconductor manufacturing and reaction model
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3. Characterization of Wafer Cleaning and Oxide Etching Using Vapor‐Phase Hydrogen Fluoride
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