Mass spectrometric determination of the percent dissociation of a high-density chlorine plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.120291
Reference15 articles.
1. Atomic chlorine concentration and gas temperature measurements in a plasma etching reactor
2. Atomic chlorine concentration measurements in a plasma etching reactor. I. A comparison of infrared absorption and optical emission actinometry
3. Theoretical and Experimental Investigations of Chlorine RF Glow Discharges: II . Experimental
4. Measurements of the Cl atom concentration in radio‐frequency and microwave plasmas by two‐photon laser‐induced fluorescence: Relation to the etching of Si
5. Chemical Kinetics of Chlorine in Electron Cyclotron Resonance Plasma Etching of Si
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