Influence of ion-beam energy and substrate temperature on the synthesis of carbon nitride thin films by nitrogen-ion-assisted pulsed laser deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.371465
Reference14 articles.
1. Structural properties and electronic structure of low-compressibility materials: β-Si3N4and hypothetical β-C3N4
2. Prediction of New Low Compressibility Solids
3. Effect of ultraviolet light irradiation on amorphous carbon nitride films
4. Study of the Chemical Composition and Microstructure of Ion Beam-deposited CNx Films Including an XPS C 1s Peak Simulation
5. Ion beam deposited carbon nitride films: characterization and identification of chemical sputtering
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3. Thermal stability of carbon nitride thin films prepared by electron cyclotron resonance plasma assisted pulsed laser deposition;Thin Solid Films;2008-10
4. Synthesis of amorphous carbon nitride by single and multiple charged nitrogen ion bombardment of fullerene thin films;Journal of Physics D: Applied Physics;2007-06-29
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