Affiliation:
1. National Institute of Standards and Technology, Physical Measurement Laboratory, Gaithersburg, MD 20899, USA
Abstract
Nanofabrication/characterization facilities enable research and development
activities across a host of science and engineering disciplines. The collection of tools
and supporting infrastructure necessary to construct, image, and measure micro- and
nanoscale materials, devices, and systems is complex and expensive to establish, and it
is costly to maintain and optimize. As a result, these facilities are typically operated
in a shared-use mode. We discuss the key factors that must be considered to successfully
create and sustain such facilities. These include the need for long-term vision and
institutional commitment, and the hands-on involvement of managers in facility
operations. We consider startup, operating, and recapitalization costs, together with
algorithms for cost recovery and tool-time allocation. The acquisition of detailed and
comprehensive project and tool-utilization data is essential for understanding and
optimizing facility operations. Only such a data-driven decision-making approach can
maximize facility impact on institutional goals. We illustrate these concepts using the
National Institute of Standards and Technology (NIST) NanoFab as our test case, but the
methodologies and resources presented here should be useful to all those faced with this
challenging task.
Funder
Physical Measurement Laboratory
Publisher
National Institute of Standards and Technology (NIST)
Reference7 articles.
1. NEMO is available free of charge at https://github.com/usnistgov/NEMO.
2. Midsize Facilities
3. The Tragedy of the Commons
4. Ostrom E (1990) Governing the Commons: The Evolution of Institutions for Collective Action (Cambridge University Press, Cambridge, U.K.).
5. The following tools shown in Table 1 are not interlocked: adhesion promoter (HMDS), deep-UV photoresist stabilization system, critical dimension microscope, contact profilometer, spectroscopic ellipsometer, stress measurement tool, reflectometer, contact angle goniometer, optical microscope 1, optical microscope 2, stereo microscope, solvent and acid benches, spin rinse dryers, wet bench cleans, KOH etch bench, and tabletop sputter coater.
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