So, You Want to Have a Nanofab? Shared-Use Nanofabrication and Characterization Facilities: Cost-of-Ownership, Toolset, Utilization, and Lessons Learned

Author:

Liddle J. Alexander1ORCID,Bowser Jerry1,Ilic B. Robert1ORCID,Luciani Vincent1

Affiliation:

1. National Institute of Standards and Technology, Physical Measurement Laboratory, Gaithersburg, MD 20899, USA

Abstract

Nanofabrication/characterization facilities enable research and development activities across a host of science and engineering disciplines. The collection of tools and supporting infrastructure necessary to construct, image, and measure micro- and nanoscale materials, devices, and systems is complex and expensive to establish, and it is costly to maintain and optimize. As a result, these facilities are typically operated in a shared-use mode. We discuss the key factors that must be considered to successfully create and sustain such facilities. These include the need for long-term vision and institutional commitment, and the hands-on involvement of managers in facility operations. We consider startup, operating, and recapitalization costs, together with algorithms for cost recovery and tool-time allocation. The acquisition of detailed and comprehensive project and tool-utilization data is essential for understanding and optimizing facility operations. Only such a data-driven decision-making approach can maximize facility impact on institutional goals. We illustrate these concepts using the National Institute of Standards and Technology (NIST) NanoFab as our test case, but the methodologies and resources presented here should be useful to all those faced with this challenging task.

Funder

Physical Measurement Laboratory

Publisher

National Institute of Standards and Technology (NIST)

Subject

General Engineering

Reference7 articles.

1. NEMO is available free of charge at https://github.com/usnistgov/NEMO.

2. Midsize Facilities

3. The Tragedy of the Commons

4. Ostrom E (1990) Governing the Commons: The Evolution of Institutions for Collective Action (Cambridge University Press, Cambridge, U.K.).

5. The following tools shown in Table 1 are not interlocked: adhesion promoter (HMDS), deep-UV photoresist stabilization system, critical dimension microscope, contact profilometer, spectroscopic ellipsometer, stress measurement tool, reflectometer, contact angle goniometer, optical microscope 1, optical microscope 2, stereo microscope, solvent and acid benches, spin rinse dryers, wet bench cleans, KOH etch bench, and tabletop sputter coater.

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