Preparation of metal doped SiO2 films by magnetron sputtering deposition using metal oxide mixture powder target
Author:
Affiliation:
1. National Institute of Technology, Sasebo College
2. National Institute of Technology, Ishikawa College
Publisher
The Materials Research Society of Japan
Link
https://www.jstage.jst.go.jp/article/tmrsj/43/1/43_27/_pdf
Reference22 articles.
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