Evaluation of photocatalytic properties of TiO<sub>2</sub> films with loading Cu and Fe-Reference-Cited by-同舟云学术

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Evaluation of photocatalytic properties of TiO₂ films with loading Cu and Fe

Published:2014 Issue:3 Volume:39 Page:365-369
ISSN:1382-3469
Container-title:Transactions of the Materials Research Society of Japan
language:en
Short-container-title:Trans. Mat. Res. Soc. Japan

Author:

Isai M.¹,Yamada Y.¹,Atsumi G.²,Shiraki R.²,Yasuda Y.³,Hoshi Y.⁴

Affiliation:

1. Graduate School of Engineering, Shizuoka University

2. Faculty of Engineering, Shizuoka University

3. Graduate School of Engineering, Tokyo Polytechnic University

4. Faculty of Engineering, Tokyo Polytechnic University

Publisher

The Materials Research Society of Japan

Reference23 articles.

1. [1] A. Fujishima and K. Honda, “Electrochemical photolysis of water at a semiconductor electrode”, Nature, 37, pp.238(1972).

2. [2] T. Takahashi, Y. Hoshi, S. Kawaguchi, E. Suzuki, and O. Kamiya, “Investigation oh high rate sputtering method for the deposition of TiO₂ films”, IEICE Tech. Re. CPM 2004-133, pp.33-38 (2004).

3. [3] Y. Hoshi, S. Kawaguchi, O. Kamiya, and H. Shimizu, “High rate deposition of TiO₂ thin films by plasma assisted reactive electron beam evaporation”, IEICE Tech. Re. CPM2006-45, pp.25-29(2006).

4. [4] J. Musil, D. Herman, and J. Sicha,“Low-temperature sputtering of crystalline TiO₂ films”, J.Vac.Sci.Tech., A, 24, pp.521-528(2006).

5. [5] T. Yazaki, T. Nagata, T. Takahashi, and Y. EMA, “Preparation of N-doped TiO₂ thin Films by sputtering using TiO₂: TiN mixed target”, IEICE Tech. Re. CPM2007-26, pp.97-102(2007).

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