Synergy Effect of Xenon Plasma Ions and Ultraviolet Lights on GaN Etch Surface Damage and Modification
Author:
Affiliation:
1. Institute of Socio-Techno Science Technology, The University of Tokushima
2. University of Hyogo
3. Nichia Corporation
Publisher
The Materials Research Society of Japan
Link
https://www.jstage.jst.go.jp/article/tmrsj/36/1/36_75/_pdf
Reference15 articles.
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3. Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy;Japanese Journal of Applied Physics;2012-01-01
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